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Ted Mooney, P.E. RET
Pine Beach, NJ
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Etching Titanium with Hydrofluoric Acid
Hi. I am a Master course student in Metallic Engineering. I am doing experiment with the Titanium. I'm using 15% HF,20% HNO3, 65% H2O for etchant and using photoresist for masking. But if I do experiment with these , it forms pittings. So I want to know the solution. Could anyone suggest an Etchant instead of this or masking material instead of photoresist?
Woong KiStudent - Chonju & Korea
March 29, 2008
Normally, you would use a ratio of 14 parts nitric acid to 1 part of 70% HF to avoid pitting. Try more nitric and less HF and less water until you get the speed and no pits that you are looking for. Some people get by with a 10 to 1 ratio for light etch with no pits.
James Watts- Navarre, Florida
April 2, 2008
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