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Ted Mooney, P.E. RET
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Chemically Polishing Fused Silica
Q. Hi Everyone,
This is my first post here. This actually has to do with glass finishing but when I use Google this site shows up a bunch (especially when it comes to the use of Ammonium Bi-fluoride). Hopefully this question is appropriate for the forum.
I am trying to not only etch but chemically polish fused silica with an ABF solution. The solution is saturated at 95 deg c and also has a small amount of surfactant added (FC-99). So far I can target my removal just fine but my results in terms of wanting a smooth finish are lacking. The surface is still fairly rough in the range of 30µ inch rms, where I want to be <5.
Here is the curious thing, If I let the solution evaporate a little I start to get a very strange effect. the edges of the part start to clear up dramatically (and measure ~3µ inch rms) but you get more than ~1.5 mm from any edge and there is a very cloudy surface left that is ~35µinch rms. The parts look horrible when this happens but there seems to be a glimmer of hope if I could just get the whole part to look like the edges!
Has anyone out there seen this before? Any suggestions would be greatly appreciated!
Manufacturing engineer - Boulder, Colorado, USA
2007
2007
A. Chemical polishing solutions form a somewhat viscous surface layer that acts as a diffusion barrier between the substrate and the reactant. This limits the reaction more in low spots than in high. Add something to thicken the solution. Or perhaps add ABF to a pickling gel for stainless steel welds.
Ken Vlach [deceased]- Goleta, California
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Rest in peace, Ken. Thank you for your hard work which the finishing world, and we at finishing.com, continue to benefit from.
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