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Etching electroless nickel

In reference to tantalum etching, I use a mix of HF, nitric, and water to etch electroless nickel. I want to get as rough a surface as possible without degrading the photoresist. HF in concentrations >15% seems to creep under the resist (more than nitric variations). Does anyone have a recommended alternative?

Kevin Keating
plating - Rochester, New York
2004

Gentle man,

ferric chloride ⇦ this on eBay or Amazon [affil links] in combination with HCl and Sodium chloride shall give you the desired finish on EN. Timing shall vary from few seconds to few minutes depending on your requirement.

Shankara Narayanan N
- Bangalore, Karnataka, India
2004

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